发明名称 Manufacturing method for patterning CIGS/CIS solar cells
摘要 A method for fabricating a shaped thin-film photovoltaic device. The method includes providing a shaped substrate member including a surface region and forming a first electrode layer overlying the surface region. Additionally, the method includes forming an absorber comprising copper species, indium species, and selenide species overlying the first electrode layer. The method further includes scribing through the absorber using a mechanical tip to form a first pattern. Furthermore, the method includes forming a window layer comprising cadmium sulfide species overlying the absorber including the first pattern. Moreover, the method includes scribing through the window layer and the absorber using the mechanical tip to form a second pattern. The second pattern is separated a distance from the first pattern.
申请公布号 US8507786(B1) 申请公布日期 2013.08.13
申请号 US20100818957 申请日期 2010.06.18
申请人 WIETING ROBERT D.;STION CORPORATION 发明人 WIETING ROBERT D.
分类号 H01L31/042 主分类号 H01L31/042
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