发明名称 Fin profile structure and method of making same
摘要 A FinFET device may include a first semiconductor fin laterally adjacent a second semiconductor fin. The first semiconductor fin and the second semiconductor fin may have profiles to minimize defects and deformation. The first semiconductor fin comprises an upper portion and a lower portion. The lower portion of the first semiconductor fin may have a flared profile that is wider at the bottom than the upper portion of the first semiconductor fin. The second semiconductor fin comprises an upper portion and a lower portion. The lower portion of the second semiconductor fin may have a flared profile that is wider than the upper portion of the second semiconductor fin, but less than the lower portion of the first semiconductor fin.
申请公布号 US8508000(B1) 申请公布日期 2013.08.13
申请号 US13408538 申请日期 2012.02.29
申请人 发明人
分类号 H01L0029/000078 主分类号 H01L0029/000078
代理机构 代理人
主权项
地址