发明名称 |
Optical element and method |
摘要 |
The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
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申请公布号 |
US8508854(B2) |
申请公布日期 |
2013.08.13 |
申请号 |
US20100966552 |
申请日期 |
2010.12.13 |
申请人 |
EVA ERIC;TAYEBATI PAYAM;THIER MICHAEL;HAUF MARKUS;SCHOENHOFF ULRICH;FLUEGGE OLE;KAZI ARIF;SAUERHOEFER ALEXANDER;FOCHT GERHARD;WEBER JOCHEN;GRUNER TORALF;CARL ZEISS SMT GMBH |
发明人 |
EVA ERIC;TAYEBATI PAYAM;THIER MICHAEL;HAUF MARKUS;SCHOENHOFF ULRICH;FLUEGGE OLE;KAZI ARIF;SAUERHOEFER ALEXANDER;FOCHT GERHARD;WEBER JOCHEN;GRUNER TORALF |
分类号 |
G02B9/00 |
主分类号 |
G02B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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