发明名称 |
METHOD OF DETERMINING OVERLAY ERROR AND CONTROL SYSTEM FOR DYNAMIC CONTROL OF RETICLE POSITION |
摘要 |
A method of determining overlay error. The method includes transferring a pattern from a reticle to a wafer and selecting a first set of data points to measure the positional difference between features on the reticle and features on the wafer. The method also includes determining a second set of data points characteristic of the first set of data points but containing fewer data points. A control system for using the second set of data points to dynamically adjust the position of the reticle.
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申请公布号 |
US2013201462(A1) |
申请公布日期 |
2013.08.08 |
申请号 |
US201213368085 |
申请日期 |
2012.02.07 |
申请人 |
LEE YUNG-YAO;WANG SOPHIA;TSAI FEI-GWO;LIU HENG-HSIN;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
LEE YUNG-YAO;WANG SOPHIA;TSAI FEI-GWO;LIU HENG-HSIN |
分类号 |
G03B27/68;G03B27/54 |
主分类号 |
G03B27/68 |
代理机构 |
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代理人 |
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地址 |
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