发明名称 |
PROCESS FOR CLEANING SHIELD SURFACES IN DEPOSITION SYSTEMS |
摘要 |
A process for cleaning and restoring deposition shield surfaces which results in a cleaned shield having a surface roughness of between about 200 microinches and about 500 microinches and a particle surface density of less than about 0.1 particles/mm2 of particles between about 1 micron and about 5 microns in size and no particles less than about 1 micron in size and method for use thereof is disclosed.
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申请公布号 |
US2013202991(A1) |
申请公布日期 |
2013.08.08 |
申请号 |
US201213365077 |
申请日期 |
2012.02.02 |
申请人 |
JINDAL VIBHU;KAGEYAMA JUNICHI |
发明人 |
JINDAL VIBHU;KAGEYAMA JUNICHI |
分类号 |
G03F1/22;B24C1/00;C23C16/04 |
主分类号 |
G03F1/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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