发明名称 SEPARATION CONTROL METHOD, AND CONTROL DEVICE FOR PLASMA PROCESSING DEVICE
摘要 Provided is a separation control method for separating an item to be processed from an electrostatic chuck which has a chuck electrode and which electrostatically adheres the item to be processed, said method being characterised by comprising: a step for measuring the current flowing from the chuck electrode for a prescribed time period once the voltage to the chuck electrode, which had been ON, is set to OFF after plasma processing, thus obtaining a time integration value for the current; a step for calculating the difference between the time integration value for the current and the electric charge charged to the chuck electrode during plasma processing; a step for calculating, from the abovementioned difference, a counter voltage which depends on the remaining electric charge of the electrostatic chuck, on the basis of the correlation between a predetermined current time integration value and the torque acting on a support pin supporting the item to be processed; and a step for setting the counter voltage to ON for the chuck electrode, whilst introducing gas into a processing chamber and generating plasma.
申请公布号 WO2013115110(A1) 申请公布日期 2013.08.08
申请号 WO2013JP51654 申请日期 2013.01.25
申请人 TOKYO ELECTRON LIMITED 发明人 KAWABATA, ATSUSHI
分类号 H01L21/683 主分类号 H01L21/683
代理机构 代理人
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