| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming method capable of forming a pattern with low refractive index and little development residue at high resolution, a pattern forming material, a photosensitive film using these, a pattern film, a low refractive index film, an optical device, and a solid state image sensor.SOLUTION: A pattern forming method includes the steps of: forming a photosensitive film with a photosensitive composition; exposing the photosensitive film; and developing the film by using a developing liquid containing an organic solvent. The photosensitive composition contains (A) hollow or porous particles, (B) a compound that generates an active species by irradiation with an active light beam or radiation, and (C) a compound that decreases solubility to a developing liquid containing an organic solvent by an action of the active species. |
