发明名称 Surface position detecting apparatus, exposure apparatus, surface position detecting method, and device manufacturing method
摘要 A surface position detecting apparatus according to an aspect of the present invention has a light-sending optical system which makes first light and second light from first and second patterns incident at different incidence angles to a predetermined surface to project an intermediate image of the first pattern and an intermediate image of the second pattern onto the predetermined surface; a light-receiving optical system which guides the first light and the second light reflected by the predetermined surface, to a first observation surface and to a second observation surface, respectively, to form an observation image of the first pattern and an observation image of the second pattern on the first and second observation surfaces; and a detecting section which detects a piece of position information of the observation image of the first pattern and a piece of position information of the observation image of the second pattern and calculates a surface position of the predetermined surface, based on the pieces of position information. The light-sending optical system has a sending-side reflecting section which reflects the second light having passed via sending-side common optical members, an even number of times to make the second light incident at the incidence angle smaller than that of the first light to the predetermined surface.
申请公布号 US8502978(B2) 申请公布日期 2013.08.06
申请号 US20090540064 申请日期 2009.08.12
申请人 HIDAKA YASUHIRO;NIKON CORPORATION 发明人 HIDAKA YASUHIRO
分类号 G01B11/00;G01B11/14 主分类号 G01B11/00
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