COMPOSITE SUBSTRATE, MANUFACTURING METHOD THEREOF AND LIGHT EMITTING ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of a composite substrate which uses an atomic layer deposition process or a plasma-enhanced atomic layer deposition process to produce a buffer layer and provides optimized process conditions.SOLUTION: A manufacturing method of a composite substrate includes the steps of: preparing a substrate 10; providing a group III element-containing precursor and a nitrogen-containing precursor alternately to the substrate to form a nitride buffer layer 11 on the substrate 10 by an atomic layer deposition process or a plasma-enhanced atomic layer deposition process; and annealing the nitride buffer layer 11 at a temperature between 300°C and 1600°C.