发明名称 SINGLE CRYSTAL SiC SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a single crystal SiC substrate, to which characteristics improved for the production of a device are imparted.SOLUTION: A single crystal SiC substrate includes a substrate main surface (35) and a substrate thickness (t), and in the single crystal SiC substrate, a local specific electrical resistance is uniformly distributed in an area of the substrate main surface (35). In the substrate main surface (35), a local specific electrical resistance calculated using the substrate thickness (t) as a standard, for a square first optional partial surface having an area of 4 mm, is different from a local specific electrical resistance of a square second optional partial surface having an area of 4 mm, by 4 m&OHgr;cm at most.
申请公布号 JP2013147425(A) 申请公布日期 2013.08.01
申请号 JP20130091406 申请日期 2013.04.24
申请人 SICRYSTAL AG 发明人 STRAUBINGER THOMAS;VOGEL MICHAEL;WOHLFART ANDREAS
分类号 C30B29/36 主分类号 C30B29/36
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