EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS

摘要

An apparatus for generating extreme ultraviolet light may include a reference member (9), a chamber (2) fixed to the reference member, the chamber including at least one window (38), a laser beam introduction optical system (50) configured to introduce an externally supplied laser beam into the chamber through the at least one window, and a positioning mechanism (10) configured to position the laser beam introduction optical system to the reference member.