| 发明名称 |
METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE |
| 摘要 |
According to one embodiment, a method is disclosed for manufacturing a semiconductor device. The method can rinse a substrate with water, a plurality of protruding patterns being formed on the substrate. The method can dry the substrate by removing water from a recess between the protruding patterns by irradiating microwaves.
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| 申请公布号 |
US2013196512(A1) |
申请公布日期 |
2013.08.01 |
| 申请号 |
US201213595076 |
申请日期 |
2012.08.27 |
| 申请人 |
KOIDE TATSUHIKO;OGAWA YOSHIHIRO;UOZUMI YOSHIHIRO |
发明人 |
KOIDE TATSUHIKO;OGAWA YOSHIHIRO;UOZUMI YOSHIHIRO |
| 分类号 |
H01L21/306;B08B3/00 |
主分类号 |
H01L21/306 |
| 代理机构 |
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