METHOD FOR MANUFACTURING PHOTOMASK AND PHOTOMASK OF MANUFACTURING USING IT

摘要

PURPOSE: A manufacturing method of a photomask is provided to produce various patterns on an object while fixing the travel route of electronic beam in one direction because the object can relatively move by a workbench. CONSTITUTION: A manufacturing method of a photomask comprises the steps of: positioning a photosensitive film (40) on a substrate (50), and forming detecting patterns for faulty patterns containing the first pattern extending to the first direction on the substrate and the second pattern overlapped with the one end of the first pattern and extending to the second direction not to the first direction. The fist and the second patterns are made by diffracted electronic beam due to the same amplifier. The detection pattern is an L-shaped pattern.