发明名称 PARTICLE BEAM SYSTEM INCLUDING A SUPPLY OF PROCESS GAS TO A PROCESSING LOCATION
摘要 A system for supplying a process gas to a processing location of a particle beam system is disclosed. The system for supplying the processing gas includes a gas reservoir, a gas conduit, a pipe located close to the processing location, a valve between the gas conduit and the pipe, and a controller configured to open and to close the valve to switch the system from a first mode of operation in which process gas is not supplied to the processing location to a second mode of operation in which process gas is supplied to the processing location. The controller can alternately open and close the valve in cycles. Each cycle can include a first duration in which the valve is open and a second duration in which the valve is closed. The ratio of the first duration to the second duration can be changed.
申请公布号 US2013187064(A1) 申请公布日期 2013.07.25
申请号 US201313746560 申请日期 2013.01.22
申请人 CARL ZEISS MICROSCOPY GMBH;CARL ZEISS MICROSCOPY GMBH 发明人 ZEILE ULRIKE;KNAPPICH MATTHIAS
分类号 F17D1/04 主分类号 F17D1/04
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