发明名称 METHOD AND SYSTEM FOR DETECTING ARC IN A SEMICONDUCTOR PROCESS
摘要 PURPOSE: An arc detection method and system in the semiconductor process are provided to not only detect an arc in the process by analyzing processing low data outputted from a processing chamber but also detect an arc within the processing chamber when radio frequency (RF) power is applied. CONSTITUTION: Normalized data is obtained by normalizing process low data which are outputted from a processing chamber (200). Parameter data related to pre-set parameters among processing low data which are outputted from the processing chamber are selected. The parameter data are normalized by applying the selected parameter data and standard low data to a fuzzy model. Whether an arc is generated within the processing chamber or not is detected by processing the obtained normalized data. The processing chamber comprises a collecting part (202) and an arc detector (204). [Reference numerals] (202) Collecting part; (204) Arc detector
申请公布号 KR20130083560(A) 申请公布日期 2013.07.23
申请号 KR20120004212 申请日期 2012.01.13
申请人 MYONGJI UNIVERSITY INDUSTRY AND ACADEMIA COOPERATION FOUNDATION 发明人 HAN, SEUNG SOO;KIM, MIN WOO;KIM, SEUNG GYUN;JEON, SUNG IK
分类号 H01L21/66 主分类号 H01L21/66
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