发明名称 |
Cleanup method for optics in immersion lithography supplying cleaning liquid onto a surface of object below optical element, liquid supply port and liquid recovery port |
摘要 |
An immersion lithography apparatus and cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided below the optical element, a supply port and a recovery port. During a cleanup process, a cleaning liquid is supplied onto the object such that the cleaning liquid covers only a portion of the surface of the object.
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申请公布号 |
US8493545(B2) |
申请公布日期 |
2013.07.23 |
申请号 |
US20090382078 |
申请日期 |
2009.03.09 |
申请人 |
KAWAI HIDEMI;NOVAK W. THOMAS;NIKON CORPORATION |
发明人 |
KAWAI HIDEMI;NOVAK W. THOMAS |
分类号 |
G03B27/52;B08B3/04;B08B3/12;G03F7/20 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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