发明名称 |
Lithographic apparatus having a feed forward pressure pulse compensation for the metrology frame |
摘要 |
A lithographic apparatus including a projection system configured to project a patterned radiation beam onto a target portion of a substrate; a metrology frame supported by a vibration isolation support device; an object movable with respect to the metrology frame; and a displacement determining unit to determine positions, speeds and/or accelerations of the object with respect to the metrology frame and/or the projection system. At least one actuator is provided for applying correcting forces and/or torques on the metrology frame, and a controller is provided which is configured to calculate the correcting forces and/or torques to be applied to the metrology frame based on the determined positions, speeds and/or accelerations of the object in order to compensate for pressure pulses exerted on the metrology frame due to movements of the object with respect to the metrology frame.
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申请公布号 |
US8493553(B2) |
申请公布日期 |
2013.07.23 |
申请号 |
US20090479145 |
申请日期 |
2009.06.05 |
申请人 |
BUTLER HANS;VAN DUIJNHOVEN MARTINUS;VAN DER WIJST MARC WILHELMUS MARIA;ASML NETHERLANDS B.V. |
发明人 |
BUTLER HANS;VAN DUIJNHOVEN MARTINUS;VAN DER WIJST MARC WILHELMUS MARIA |
分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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