发明名称 |
Plasma deposited coatings, and low temperature plasma method of making same |
摘要 |
A method of depositing a substantially hydrogen free or controlled hydrogen content multi-element alloy film on a substrate. The method utilizes a microwave excited plasma of a hydrogen free precursor gas to deposit a hard, adherent coating. The method comprises providing a substrate to be coated in a vacuum deposition chamber, with a source of microwave energy coupled to the vacuum deposition chamber. A substantially hydrogen free reaction gas precursor composition is introduced into the reaction chamber at a pressure corresponding substantially to a pressure minimum of the modified Paschen curve for the reaction gas precursor composition. Activation of the source of microwave energy excites the reaction gas precursor composition, in this way forming a plasma in the vacuum deposition chamber to deposit a substantially hydrogen free or controlled hydrogen content multi-element alloy film on the substrate.
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申请公布号 |
US4737379(A) |
申请公布日期 |
1988.04.12 |
申请号 |
US19870032263 |
申请日期 |
1987.03.31 |
申请人 |
ENERGY CONVERSION DEVICES, INC. |
发明人 |
HUDGENS, STEPHEN J.;JOHNCOCK, ANNETTE G.;OVSHINSKY, STANFORD R.;NATH, PREM |
分类号 |
C23C16/50;C23C16/30;C23C16/34;C23C16/40;C23C16/42;C23C16/511;H01J37/32;H01L21/205;(IPC1-7):B05D3/06 |
主分类号 |
C23C16/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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