发明名称 POLISHING PAD HAVING A HIGH-CONTENT OF ABRASIVE INGREDIENTS AND METHOD OF MANUFACTURING THE SAME
摘要 PURPOSE: A polishing pad having high-content abrasive ingredients and a manufacturing method thereof are provided to reduce the work time by loading reinforcing cover layers on the side walls of polishing cells without an additional process. CONSTITUTION: A polishing pad (100) having high-content abrasive ingredients polishes the surface of a plate-shaped object by forming multiple polishing cells (20) having a three-dimensional structure on a base (10). Each of the polishing cells is a composition comprising 60-90 weight% of abrasive ingredients, 10-40 weight% of binder ingredients, and a pore former. Reinforcing cover layers (30) are loaded on the outer side surfaces (23) of the polishing cells to reinforce crushing strength. The top surfaces (21) of the polishing cells are open.
申请公布号 KR20130083161(A) 申请公布日期 2013.07.22
申请号 KR20120003756 申请日期 2012.01.12
申请人 MICRO CHEMICAL KOREA CO., LTD. 发明人 MOON, DEOG JU
分类号 B24D11/02;B24D7/08 主分类号 B24D11/02
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