发明名称 THIN FILM FORMING DEVICE AND THIN FILM FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a thin film forming device capable of suppressing an increase in a tact time for thin film formation even when the number of alignment marks for measuring an amount of expansion and contraction of an object are increased.SOLUTION: A coating stage holds an object. Image data of a thin film pattern to be formed in the object is stored in a storage device. A nozzle unit discharges droplets of a fluid material toward the object held on the coating stage. A conveying device coveys the object from a storage location to the coating stage. A first detector detects at least three alignment marks formed in the object during object conveyance by the conveying device. A control device calculates an amount of expansion and contraction of the object on the basis of the detection results of the first detector, corrects the image data stored in the storage device on the basis of the calculated amount of expansion and contraction, and forms a thin film pattern in the object by controlling the nozzle unit on the basis of the corrected image data.
申请公布号 JP2013143462(A) 申请公布日期 2013.07.22
申请号 JP20120002665 申请日期 2012.01.11
申请人 SUMITOMO HEAVY IND LTD 发明人 OKAMOTO YUJI
分类号 H05K3/28;B05C5/00;B05C13/02;B05D1/26;G03F7/20;H05K3/10 主分类号 H05K3/28
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