MANUFACTURING METHOD FOR SILICON-CONTAINING FILM AND MANUFACTURING METHOD FOR PHOTOELECTRIC CONVERSION DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a silicon-containing film on a substrate without causing film peeling.SOLUTION: A manufacturing method for a silicon-containing film comprises: a first step of dry-cleaning the inside of a chamber using fluorine-containing gas; a second step of carrying a substrate into the chamber; a third step of purging the inside of the chamber with the substrate provided in the chamber using silane-based gas; and a fourth step of forming a silicon-containing film on the substrate after the third step.