发明名称 ADDITIVES TO LITHO INKS TO ELIMINATE INK FEEDBACK
摘要 Provided are web-offset lithographic ink compositions that contain an alkyl thioether surfactant, an alkoxylated modified rosin, or a combination thereof. The ink compositions can be oil-based inks or water-based inks that can be radiation-curable. The resulting ink compositions can be used in web-offset lithographic printing to substantially reduce or eliminate the ink feedback and ink build-up that occurs during printing. Also provided are methods for reducing or eliminating ink feedback and build-up during lithographic printing processes.
申请公布号 WO2013043921(A3) 申请公布日期 2013.07.18
申请号 WO2012US56415 申请日期 2012.09.20
申请人 SUN CHEMICAL CORPORATION 发明人 KRISHNAN, RAMASAMY;JONES, JEFF;HELLIBLAU, MATTHIAS
分类号 C09D11/00;B41M1/06;C09D11/02 主分类号 C09D11/00
代理机构 代理人
主权项
地址