发明名称
摘要 <P>PROBLEM TO BE SOLVED: To detect the Z position of the surface of a movable body and control the movable body accurately on the basis of the surface information of an object detected during mapping, when an exposure operation is conducted. <P>SOLUTION: A controller detects the Z positions of Y scales 39Y<SB>2</SB>and 39Y<SB>1</SB>on the upper surface of a stage WST by Z heads 72a-72d of a measuring system while a stage WST is moving in Y-axis direction, and uses a multi-point AF system (90a, 90b) to do mapping for acquiring the surface information of a wafer W. In addition, Z heads 74<SB>i</SB>and 76<SB>j</SB>are used to detect the Z positions of Y scales 39Y<SB>2</SB>and 39Y<SB>1</SB>, and the stage is positionally controlled on the basis of the wafer surface information acquired during mapping, and a pattern is formed on the wafer. An area on the Y scale 39 to be detected by the Z heads 72a-72d during mapping is at least partly common to that on the Y scale detected by the Z heads 74<SB>i</SB>and 76<SB>j</SB>during exposure. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP5234486(B2) 申请公布日期 2013.07.10
申请号 JP20070219108 申请日期 2007.08.24
申请人 发明人
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
代理机构 代理人
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