METHOD FOR FORMATION OF ULTRATHIN FILM

摘要

FIELD: metallurgy.SUBSTANCE: method includes deposition of adsorbate vapours onto a substrate in vacuum and growing of a film from single layers. Deposition is carried out at minimum possible kinetic energy of adsorbate atoms, and also under thermal capacity of vapours and substrate temperature providing for absence of adsorbate atoms mixing with the substrate and formation of island aggregates of the adsorbate in the film. Density of adsorbate vapours simultaneously and in the entire length along the section parallel to the surface of the substrate is maintained identical.EFFECT: increased quality of a produced ultrathin film.7 cl, 17 dwg