METHOD FOR RESTORING FLAW OF SURFACE OF SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a method for locally restoring minute flaws of the surface of a substrate in a short time.SOLUTION: The method includes supplying a precursor to the periphery of minute flaws of the surface of the substrate, and irradiating the precursor with first laser beams causing the decomposition reaction of the precursor and irradiating the flaws with second laser beams causing the temperature rise of the substrate each simultaneously, so that the minute flaws of the surface of the substrate are restored locally in a short time.