| 摘要 |
An etching device includes a treatment target holding device holding a treatment target and a plasma generation device, etching the treatment target using generated plasma. The treatment target holding device includes a treatment target supporting member on which the treatment target is mounted, a ring-shaped focus ring that has a step part in a predetermined position, and a protective film containing yttria. The treatment target supporting member has a positioning pin that fixes the focus ring on a focus ring mounting region, the focus ring has a cavity part in a position corresponding to the positioning pin. The protective film is formed on a bottom surface and a side surface that configure the step part and on an upper surface of the focus ring corresponding to a formation position of the cavity part.
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