SUBSTRATE PROCESS METHOD

摘要

PURPOSE: A substrate processing method is provided to improve process efficiency and productivity by reducing the quantity of used process gas materials. CONSTITUTION: A substrate is received on a substrate supporter inside a chamber (S111). Process gases are supplied to the chamber (S112). A first stabilization process is performed by corresponding to preset first stabilization time information (S113). A second stabilization process to automatically control the opening of a valve with a feedback method is performed (S114). A thin film is deposited on the substrate (S115). The substrate is outputted to the outside (S116). [Reference numerals] (S111) Substrate is received; (S112) Fluid is supplied to a chamber; (S113) First stabilization; (S114) Second stabilization (automatic control); (S115) Process is performed; (S116) Substrate is discharged