Device, used for loading and unloading substrates to be treated in batch process, includes processing chamber, and a lock chamber, where processing and lock chambers are bounded via chamber walls and comprise substrate transporting device

摘要

The device comprises a processing chamber, and a lock chamber (1) for loading and unloading substrates (4), where the processing chamber and the lock chamber are bounded via chamber walls, and comprise an inner substrate transporting device, and/or a loading robot (6) with a guide system (5). The guide system is arranged on an upper side of the lock chamber. The loading robot is positioned by the guide system along the extension of a portion of the substrate transporting device belonging to the lock chamber. The substrates are arranged on the substrate transporting device. The device comprises a processing chamber, and a lock chamber (1) for loading and unloading substrates (4), where the processing chamber and the lock chamber are bounded via chamber walls, and comprise an inner substrate transporting device, and/or a loading robot (6) with a guide system (5). The guide system is arranged on an upper side of the lock chamber. The loading robot is positioned by the guide system along the extension of a portion of the substrate transporting device belonging to the lock chamber. The substrates are arranged on the substrate transporting device on substrate supports, which are arranged in a row and are connected to one another, where the chamber walls comprise an aperture in a region of the substrate support. The substrate support comprises a substrate retainer that is designed so that the substrate, from which a position provided for a substrate transport is rotated, is placed on the substrate support. The substrate comprises front side edges. The substrate retainer partially covers the substrate support. An independent claim is included for a method for loading and unloading substrates to be treated in a batch process.