发明名称 |
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, RESIST FILM, PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE, EACH USING THE COMPOSITION |
摘要 |
<p>Disclosed are an actinic ray-sensitive or radiation-sensitive resin composition including (A) a compound capable of generating an acid by irradiation of actinic rays or radiation, and (B) a resin of which solubility in an alkali developer increases by being decomposed by the action of an acid, and, a resist film, a pattern forming method, an electronic device manufacturing method, and an electronic device, each using the composition, wherein the actinic ray-sensitive or radiation-sensitive resin composition contains at least one type of a specific compound represented by General Formula (A-I) and at least one type of a specific compound represented by General Formula (A-II) as the compound (A).</p> |
申请公布号 |
WO2013099662(A1) |
申请公布日期 |
2013.07.04 |
申请号 |
WO2012JP82596 |
申请日期 |
2012.12.10 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
SHIBUYA, AKINORI;IWATO, KAORU |
分类号 |
G03F7/004;G03F7/039;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|