| 摘要 |
An inductively coupled plasma reactor is provided to generate high density plasma uniformly by supplying gas uniformly and increasing magnetic flux transfer efficiency. An inductively coupled plasma reactor comprises a vacuum chamber(10), a dielectric window(34), a wireless frequency antenna(30), a flat panel electrode, a plurality of gas supply holes(36), and a gas supply part(25). The vacuum chamber has a substrate support device(16). The dielectric window is installed on the vacuum chamber. The gas supply holes are formed in the dielectric window. The gas supply part supplies process gas into the vacuum chamber through the gas supply holes. A magnetic core cover(32) is installed toward the dielectric window. First and second power supply sources(50,52) supply first and second powers to the wireless frequency antenna and to the flat panel electrode. |
