发明名称 High-purity Cu bonding wire
摘要 Provided is a ball bonding wire of a high-purity copper alloy, the wire having a high recrystallization temperature and being easily produced through wiredrawing with a die at room temperature. The ball bonding wire has a low initial ball hardness and causes no breakage of IC chips. Phosphorus (P) is added in an amount as slight as 0.5-15 mass ppm to high-purity copper having a purity of 99.9985 mass% or higher to thereby produce a copper alloy which has a higher recrystallization temperature than high-purity copper having a purity of 99.9999 mass% or higher and which has a lowered initial ball hardness in ball bonding. Those characteristics are thus achieved. Alternatively, phosphorus (P) is added in an amount as slight as 0.5-15 mass ppm to high-purity copper having a purity of 99.9985 mass% or higher, and the total amount of any other impurities contained in the copper is reduced to a value lower than the phosphorus (P) content. Those characteristics are thereby achieved.
申请公布号 KR101280053(B1) 申请公布日期 2013.06.28
申请号 KR20127024832 申请日期 2010.03.25
申请人 发明人
分类号 C22C9/00;H01L21/60 主分类号 C22C9/00
代理机构 代理人
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