| 摘要 |
PURPOSE: Wafer inspection apparatus and a control device thereof are provided to easily find the location of surface contamination in the repair stage of a wafer, thereby improving the efficiency of repair work and regeneration work. CONSTITUTION: A first in/out port(5) and a second in/out port(6) take charge of taking in and taking out of a wafer. A reject port stores a wafer rejected as a result of inspection. An alignment part(4) performs alignment for a wafer. An inspection robot(3) guides the wafer to an operator region. A transfer robot(2) transfers a wafer between the inspection robot and the in/out ports, and between the alignment part and the inspection robot.
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