发明名称 Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film
摘要 Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin prepared by a phosphorous-containing diamine represented by the following Chemical Formula 1, (B) a photosensitive diazoquinone compound, and (C) a solvent. A photosensitive resin film prepared using the same and a semiconductor device including the photosensitive resin film are also disclosed. In Chemical Formula 1, each substituent is the same as defined in the detailed description.
申请公布号 US2013164682(A1) 申请公布日期 2013.06.27
申请号 US201213603522 申请日期 2012.09.05
申请人 CHO HYUN-YONG;KIM SANG-SOO;YOON EUN-KYUNG;LEE JONG-HWA;LEE JUN-HO;HWANG EUN-HA;KWON JI-YUN;LEE JIN-YOUNG;CHEIL INDUSTRIES INC. 发明人 CHO HYUN-YONG;KIM SANG-SOO;YOON EUN-KYUNG;LEE JONG-HWA;LEE JUN-HO;HWANG EUN-HA;KWON JI-YUN;LEE JIN-YOUNG
分类号 G03F7/022 主分类号 G03F7/022
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