发明名称 |
Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film |
摘要 |
Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin prepared by a phosphorous-containing diamine represented by the following Chemical Formula 1, (B) a photosensitive diazoquinone compound, and (C) a solvent. A photosensitive resin film prepared using the same and a semiconductor device including the photosensitive resin film are also disclosed. In Chemical Formula 1, each substituent is the same as defined in the detailed description.
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申请公布号 |
US2013164682(A1) |
申请公布日期 |
2013.06.27 |
申请号 |
US201213603522 |
申请日期 |
2012.09.05 |
申请人 |
CHO HYUN-YONG;KIM SANG-SOO;YOON EUN-KYUNG;LEE JONG-HWA;LEE JUN-HO;HWANG EUN-HA;KWON JI-YUN;LEE JIN-YOUNG;CHEIL INDUSTRIES INC. |
发明人 |
CHO HYUN-YONG;KIM SANG-SOO;YOON EUN-KYUNG;LEE JONG-HWA;LEE JUN-HO;HWANG EUN-HA;KWON JI-YUN;LEE JIN-YOUNG |
分类号 |
G03F7/022 |
主分类号 |
G03F7/022 |
代理机构 |
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代理人 |
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地址 |
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