SUBSTRATE HOLDING AND ROTATING DEVICE, SUBSTRATE TREATMENT APPARATUS INCLUDING THE DEVICE, AND SUBSTRATE TREATMENT METHOD

摘要

PURPOSE: A substrate holding and a rotating device, a substrate treatment apparatus including the device, and a substrate treatment method are provided to prevent particles by stabilizing the flow of air around a substrate. CONSTITUTION: A turn table(7) rotates around a rotation axis. A rotation drive unit rotates the turn table. A holding member(10) maintains a substrate horizontally. A protection disk(15) has the same size as the substrate. A magnetic levitation device elevates the protection disk from the turn table. [Reference numerals] (32) Processing solution supply source; (38) Arm driving device; (40) Control device; (5) Guard driving device; (71) Inert gas supply source