DEVICE AND METHOD FOR HOT-WIRE CHEMICAL VAPOUR DEPOSITION

摘要

The invention relates to a device and method for hot-wire chemical vapour deposition (HWCVD) which includes a vacuum chamber; at least one catalytic filament provided with at least two electrical contacts; and a means for removing a portion of the catalytic filament from a deposition area and for replacing same with another portion of the catalytic filament; wherein the means includes a first reel and a second reel for each catalytic filament. The second reels are mechanically coupled to a motor with controlled position or speed. A tension-adjustment mechanism, mechanically coupled to each first reel, includes at least one constant-force spring for applying a pulling force that keeps the catalytic filament tense under any operating conditions. Furthermore, the device is provided with a system for protecting against the deterioration of at least one of the cold portions of the catalytic filaments.