发明名称 THIN FILM TRANSISTOR HAVING ACTIVE LAYER CONSISTING OF INDIUM CONTAINING SILICON AND GERMANIUM AND DISPLAY DEVICE HAVING THE SAME
摘要 <p>PURPOSE: A thin film transistor having an active layer consisting of indium containing silicon and germanium and a display device having the same are provided to secure an active layer having high electrical characteristic. CONSTITUTION: A gate insulating layer(120) is formed on a substrate. An active layer(130) includes a channel region. The active layer is made of a material of In, Si, Ge, and O composition. A source electrode(140) is separated from a drain electrode(150) on the gate insulating layer. The source electrode and the drain electrode are electrically connected to the active layer.</p>
申请公布号 KR20130068367(A) 申请公布日期 2013.06.26
申请号 KR20110135471 申请日期 2011.12.15
申请人 SAMSUNG CORNING PRECISION MATERIALS CO., LTD. 发明人 HAN, JIN WOO;YU, TAE HWAN;CHO, JO HANN;LEE, SEUNG JU
分类号 H01L29/786;H01L51/50 主分类号 H01L29/786
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