发明名称 Diffusion barrier layer for thin film solar cell
摘要 <p>A method of fabricating a solar cell e.g. CuZnSn(S,Se) (CZTSSe), that includes the following steps. A substrate is coated with a molybdenum (Mo) layer. A stress-relief layer is deposited on the Mo layer. The stress-relief layer is coated with a diffusion barrier. Absorber layer constituent components are deposited on the diffusion barrier, wherein the constituent components comprise one or more of sulfur (S) and selenium (Se). The constituent components are annealed to form an absorber layer, wherein the stress-relief layer relieves thermal stress imposed on the absorber layer, and wherein the diffusion barrier blocks diffusion of the one or more of S and Se into the Mo layer. A buffer layer is formed on the absorber layer. A transparent conductive electrode is formed on the buffer layer.</p>
申请公布号 GB2497909(A) 申请公布日期 2013.06.26
申请号 GB20130007919 申请日期 2011.10.20
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BYUNGHA SHIN;NESTOR BOJARCZUK;SUPRATIK GUHA;KEJIA WANG
分类号 H01L31/18;H01L31/0224;H01L31/032 主分类号 H01L31/18
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