| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an apparatus for treating an exhaust gas which avoids recombination of PFC (perfluoro compound) and brings about the high removing rate of PFC while preventing troubles such as clogging of pipes at the lower stage of an excitation section and a machine breakdown. <P>SOLUTION: The apparatus for treating an exhaust gas 10 which removes a hazardous gas constituent contained in the exhaust gas exhausted from manufacture equipment semiconductor 1 comprises a removing-by-reaction section A41 removing a part of the hazardous gas constituent, the excitation section 42 exciting a residual part of the hazardous gas constituent, a removing-by-reaction section B43 removing the hazardous gas constituent excited by the excitation section 42, and evacuation pumps 3, 44 for evacuating the semiconductor manufacture equipment 1 and the excitation section 42 respectively. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
