发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <p>PURPOSE: A method for manufacturing a semiconductor device is provided to manufacture the semiconductor device with high reliability, by suppressing generation of void at the interface between the semiconductor device and an under fill sheet. CONSTITUTION: A rear grinding tape (1) and a sealing sheet comprising an under fill material (2) are prepared. The rear grinding tape includes a base film and an adhesive layer. A connection member (4) of a semiconductor wafer (3) is formed on a circuit surface (3a). The circuit surface and the under fill material of the sealing sheet are compressed. A semiconductor device having the under fill material is formed by dicing the semiconductor wafer. The semiconductor device and an adherend are connected through the connection member.</p>
申请公布号 KR20130069438(A) 申请公布日期 2013.06.26
申请号 KR20120145058 申请日期 2012.12.13
申请人 NITTO DENKO CORPORATION 发明人 MORITA KOSUKE;TAKAMOTO NAOHIDE;SENZAI HIROYUKI
分类号 H01L21/301 主分类号 H01L21/301
代理机构 代理人
主权项
地址