| 摘要 |
PURPOSE: A substrate processing system is provided to remove an etch byproduct and fumes while preventing damage to a lower film. CONSTITUTION: A cassette module(100) receives substrates before a treatment process and after the treatment process. An atmosphere transport module(200) transports the substrate in the cassette module. A process module(500) etches a silicon oxide film formed on the substrate by spraying a process gas to the substrate. A vacuum transport module(400) transports the substrate to the process module in a vacuum state. A loading and unloading module(300) is connected to the atmosphere transport module and the vacuum transport module.
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