发明名称 |
CMP PAD CONDITIONER AND METHOD OF MANUFACTURING THE SAME |
摘要 |
PURPOSE: A CMP(Chemical Mechanical Polishing) pad conditioner and a manufacturing method thereof are provided to basically prevent a substrate from being bent and diamond of the conditioner from being separated by forming the CMP pad conditioner using a selective deposition method. CONSTITUTION: A diamond thin film(12) is formed on a substrate(11). A mask(30) having an opening part(35) in a matrix type is placed on the diamond thin film. The mask is made of one selected from molybdenum, tungsten and graphite. A protrusion part(15) comprising diamond(40) is formed on the diamond thin film. The mask is removed.
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申请公布号 |
KR20130068820(A) |
申请公布日期 |
2013.06.26 |
申请号 |
KR20110136213 |
申请日期 |
2011.12.16 |
申请人 |
KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY |
发明人 |
BAIK, YOUNG JOON;PARK, JONG KEUK;LEE, WOOK SEONG |
分类号 |
H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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