| 摘要 |
PURPOSE: An etchant for an array panel and an array substrate manufacturing method using the same are provided to reduce a processing time by simultaneously etching triple layers in one wet process. CONSTITUTION: A barrier metal layer(101b) and a copper metal layer(101a) are deposited on a lower substrate(100). A block layer(102a) formed of a silicon nitride-based insulating material is coated on the lower substrate. A photo-resistor layer is coated on an entire area of the lower substrate. A photo-resist pattern(120) is formed by performing a mask photolithography. A gate line and a gate electrode(101) are formed by etching the copper metal layer, the barrier metal layer, and the block layer at once. |
