| 发明名称 |
Sputtering apparatus and driving method thereof |
| 摘要 |
A sputtering apparatus for depositing a target material on a substrate includes a chamber, a target in the chamber to provide the target material, a carrier to carry the substrate in the chamber to face the target, and a plurality of masks arranged along sides of the carrier and being movable back and forth with respect to the carrier.
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| 申请公布号 |
US8470142(B2) |
申请公布日期 |
2013.06.25 |
| 申请号 |
US20060451440 |
申请日期 |
2006.06.13 |
| 申请人 |
KIM SUNG EUN;LIM TAE HYUN;YOO HWAN KYU;YOO KWANG JONG;MOON YANG SIK;AN BYEONG CHEOL;LG DISPLAY CO., LTD.;AVACO CO., LTD.;LG ELECTRONICS, INC. |
发明人 |
KIM SUNG EUN;LIM TAE HYUN;YOO HWAN KYU;YOO KWANG JONG;MOON YANG SIK;AN BYEONG CHEOL |
| 分类号 |
C23C14/34 |
主分类号 |
C23C14/34 |
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