| 摘要 |
<P>PROBLEM TO BE SOLVED: To form a thin film pattern of high definition on a large substrate by carrying out vapor deposition only once. <P>SOLUTION: A vapor deposition mask 1 is used for forming a plurality of thin film patterns arranged at a specific arrangement pitch on a substrate, and includes: a visible-light transmitting resin film 2 with the same area as that of the substrate, on which a plurality of opening patterns 4 of the same size and shape as those of the thin film patterns are formed and arranged at the same arrangement pitch as that of the plurality of thin film patterns; and a holding member 3 made to tightly contact one face of the resin film 2, made from a magnetic metal plate on which a plurality of penetrating openings 5, each corresponding to the opening patterns 4 respectively, of a larger size and shape relative to those of the opening patterns 4 are formed; wherein the thermal expansion coefficient of the holding member 3 is lower than 6×10<SP POS="POST">-6</SP>/°C. <P>COPYRIGHT: (C)2013,JPO&INPIT |
