发明名称 SOFT MOLD AND METHOD MANUFACTURING THE SAME
摘要 PURPOSE: A soft mold and a manufacturing method of the same are provided to manufacture electrode patterns of 80um or less line widths by charging highly viscose fluid and forming a mold pattern. CONSTITUTION: A manufacturing method of a soft mold includes the following steps of: processing the surface(12) of a silicon substrate(10) based on a reactive ion etching method to have nanoscale surface roughness; patterning a photoresist pattern(20) on the surface of the silicon substrate; coating the surface of the silicon substrate with polymer(40); and separating the silicon substrate from the polymer to obtain a soft mold(50). The soft mold has the nanoscale surface roughness and a mold pattern(56). The mold pattern is charged with highly viscose fluid and is transferred on the surface of a touch panel.
申请公布号 KR20130067182(A) 申请公布日期 2013.06.21
申请号 KR20110134058 申请日期 2011.12.13
申请人 KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY;HANA MICRO CO., LTD. 发明人 LEE, SEUNG S;KIM, JIN HA;LIM, HUN KWANG;LEE, JUNG WOO
分类号 B82B3/00;B29C33/38 主分类号 B82B3/00
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