发明名称
摘要 A method of providing airflow management in a substrate production tool includes providing a first mechanism coupling the substrate production tool to a fan filter unit. The fan filter unit provides filtered air to the substrate production tool. A second mechanism couples the substrate production tool to a reduced pressure exhaust mechanism. The reduced pressure exhaust mechanism provides an exhaust for excess gas flow within the substrate production tool. A substrate process area of the substrate production tool is maintained at a lower pressure than a pressure of a substrate transfer section of the substrate production tool. The substrate process area maintains a higher pressure than a pressure of the reduced pressure exhaust mechanism. The substrate transfer section maintains a higher pressure than the pressure of the reduced pressure exhaust mechanism.
申请公布号 JP2013526009(A) 申请公布日期 2013.06.20
申请号 JP20130501433 申请日期 2011.03.23
申请人 发明人
分类号 H01L21/02;H01L21/304;H01L21/306;H01L21/677 主分类号 H01L21/02
代理机构 代理人
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