| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a wafer carrier made of materials which have strength and rigidity under elevated temperatures and which do not react with gases employed in a process. <P>SOLUTION: A wafer carrier 30 for a rotating disc CVD reactor includes a unitary plate 32 of a ceramic such as silicon carbide and also includes a hub 40 removably mounted to the plate 32 in a central region of the plate 32. The hub 40 provides a secure connection to a spindle 16 of the reactor without imposing concentrated stresses on the ceramic plate 32. The hub 40 can be removed during cleaning of the plate 32. <P>COPYRIGHT: (C)2013,JPO&INPIT |
