发明名称 VACUUM DEPOSITION APPARATUS
摘要 PURPOSE: A vacuum deposition apparatus is provided to maintain a vacuum in a deposition chamber regardless of the state of a supply unit in the deposition chamber by closing a vacuum valve between the deposition chamber and the supply unit. CONSTITUTION: A vacuum deposition apparatus(1) comprises a deposition chamber(100), a supply unit(200), and a vacuum valve(300). The deposition chamber comprises a chamber body(110), a crucible(120) arranged inside the chamber body and filled with a deposition material, and a supply tube(130) which is formed in the chamber body and guides the deposition chamber to be supplied to the crucible. The supply unit is arranged outside the deposition chamber and supplies the deposition material into the deposition chamber. The vacuum valve connects and disconnects the deposition chamber and the supply unit in a vacuum condition.
申请公布号 KR101277067(B1) 申请公布日期 2013.06.20
申请号 KR20100104924 申请日期 2010.10.26
申请人 发明人
分类号 C23C14/24;C23C14/56;H01L51/56 主分类号 C23C14/24
代理机构 代理人
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