| 摘要 |
PURPOSE: An antenna unit and an inductively coupled plasma processing apparatus are provided to perform uniform plasma processing. CONSTITUTION: An antenna (13) is configured to have more winding numbers in the corner than the center of a side as a plurality of antenna wires in the same plane, and make the entire body as a vortex shape. The antenna forms an arrangement region of the antenna wires as a frame shape. The antenna forms a curved unit (68) in each antenna wire to make the frame region surrounded by the outer line or the inner line linearly symmetric to the center line. The curved unit is located between the center of the side and the corner and varies the number of the winding. |
