发明名称 METHOD OF GROWING SILICON SINGLE CRYSTAL
摘要 <p>This method for producing silicon single crystals includes: growing a silicon single crystal by the Czochralski method while cooling at least part of the silicon single crystal under growth with a cooling member which circumferentially surrounds the silicon single crystal and has an inner contour that is coaxial with a pull axis, wherein an ambient gas in which the silicon single crystal is grown includes a hydrogen-atom-containing substance in gaseous form. This silicon single crystal is produced by the above method.</p>
申请公布号 EP1895026(B1) 申请公布日期 2013.06.19
申请号 EP20050782038 申请日期 2005.09.12
申请人 SUMCO CORPORATION 发明人 INAMI, SHUICHI;MURAKAMI, HIROKI;TAKASE, NOBUMITSU;HAMADA, KEN;NAKAMURA, TSUYOSHI
分类号 C30B15/14;C30B15/04;C30B29/06 主分类号 C30B15/14
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